Wafer-scale broadband antireflective silicon fabricated by metal-assisted chemical etching using spin-coating Ag ink
نویسندگان
چکیده
منابع مشابه
Broadband antireflective silicon nanostructures produced by spin-coated Ag nanoparticles
We report the fabrication of broadband antireflective silicon (Si) nanostructures fabricated using spin-coated silver (Ag) nanoparticles as an etch mask followed by inductively coupled plasma (ICP) etching process. This fabrication technique is a simple, fast, cost-effective, and high-throughput method, making it highly suitable for mass production. Prior to the fabrication of Si nanostructures...
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ژورنال
عنوان ژورنال: Optics Express
سال: 2011
ISSN: 1094-4087
DOI: 10.1364/oe.19.0a1109